Products
Contact Us
- Contact Person : Ms. Liu Lucy
- Company Name : Dalian King Choice Non-Ferrous Metals Products Co., Ltd.
- Tel : 86-411-82770123
- Fax : 86-411-82771234
- Address : Liaoning,Dalian,Unit 411, No. 11, Lianjingyuan, Zhongshan District, Dalian City, Liaoning Province, China
- Country/Region : China
- Zip : 116001
Products List
ZnO target Ceramic Target sputtering target
ZnO Target,
made by Hot press,
has a high purity as 4N min. and is used as sputtering target
ZnO Target, made by Hot press, has a high purity as 4N min. used as sputtering target ...
zirconium sputtering target zirconium products
zirconium sputtering target
used as electrode;
Purity: zirconium 99.5% min.
Roughness: 0.8um
zirconium sputtering targetZr Target with srews,used as electrode;Purity:zirconium 99.5% min.Roughness: 0.8um ...
Aluminum target Al target sputtering target
aluminum target
Purity: 3N~5N
Surface condition: Ground
Tolerance: +/-0.2mm
Supply on request
Aluminum targetPurity: 3N~5NSurface condition: Ground Tolerance: +/-0.2mmSupply on requestused for sputtering ...
AZO(ZnO+Al2O3) target ceramic target
AZO target
Al2O3:2wt%, 3.13wt%,0.5wt%,or upon request
Purity: 3N~4N
Processing Method: Hot Press
Tolerance: +/-0.2mm
AZO targetAl2O3:2wt%, 3.13wt%,0.5wt%,or upon requestPurity: 3N~4NProcessing Method: Hot PressTolerance: +/-0.2mm Delivery term: 20...
AgCu alloy Target sputtering target
AgCu alloy Target
as sputtering target is available.
Purity: 4N min.
Weight ratio: Ag72wt%+Cu28wt%, etc.
Density: 10g/cm3
AgCu alloy Target as sputtering target is available.Purity: 4N min.Weight ratio: Ag72wt%+Cu28wt%, etc.Density: 10g/cm3 ...
Tungsten Filament tungsten coil for vacuum coating
Tungsten Filaments are made of tungsten wires,
have high melting point and
good corrosion resistance.
Tungsten Filamentmade of tungsten wires,have high melting point and good corrosion resistance. ...
Ceramic Target TiO2 target ZnO target ZrO2 target NiO target
Ceramic Target
TiO2,ZnO,NiO,ZrO2,etc.,
3N5 min/4N min.,
made by hot press,
as sputtering targets.
Ceramic TargetTiO2,ZnO,NiO,ZrO2,etc.,with 3N5 min or 4N min.,made by hot press are available as sputtering targets. ...
Boron carbide target B4C target ceramic target
Boron carbide target
ceramic target
Purity: 90%
Processing method:Hot press
Surface condition: Ground
Boron carbide targetPurity: 90%Processing method: Hot pressSurface condition: GroundDelivery time: 30 days ...
TiAl Target TiAl alloy TiAl product for sputtering
TiAl Target
Used as sputtering target
Atom Ration: 50:50, 75:25 or customer designs
Purity: TiAl 99.8% min.
TiAl TargetUsed as sputtering target for coating toolsAtom Ration: 50:50, 75:25 or according to customer designsPurity: TiAl 99.8%...
Silicon Target sputtering target Poly/Single Crystal target
Silicon Target
Purity: Si 5N or 6N
Resistity:0.02ohm/cm max;0.5-5 ohm/cm max.
Type: Single and Poly Si Targets
Silicon Target sputtering targetType: Single crystal Si target and Poly crystal Si targetPurity: Si:99.999% min. and...