Products
Contact Us
- Contact Person : Ms. Liu Lucy
- Company Name : Dalian King Choice Non-Ferrous Metals Products Co., Ltd.
- Tel : 86-411-82770123
- Fax : 86-411-82771234
- Address : Liaoning,Dalian,Unit 411, No. 11, Lianjingyuan, Zhongshan District, Dalian City, Liaoning Province, China
- Country/Region : China
- Zip : 116001
Products List
TiAl Target TiAl alloy sputtering target
TiAl Target
Used as sputtering target
Atom Ration:50:50,75:25 or customer designs
Purity:99.8% min
Relative Density:3.7g/cm3
TiAl Target Used as sputtering target for coating toolsAtom Ration: 50:50, 75:25 or according to customer designsPurity: TiAl...
Zirconium Target Zirconium product sputtering target
Zirconium Target
used as electrode;
Purity: Zirconium 99.5% min.
Roughness: 0.8um
purity:3N5
Zirconium Target with srews,used as electrode;Purity: Zr 99.5% min. Roughness: 0.8um ...
Aluminum Crimps Aluminun coil for vacuum coating
Aluminum Crimps
Application:as vaccum evaporation material
Al purity: 99.9% min.or 99.99%
Shape: according to customer's o
Aluminium Crimps used for vacuum coatingAl purity: 99.6% min.or 99.9% min.Shape: according to buyer's option ...
Silicon Target Si target 5N sputtering target
Silicon Target
Purity: Si 5N or 6N
Resistity:0.02ohm/cm max. or 0.5-5 ohm/cm max.
Type: Single and Poly Si Targets
Silicon Target Type: Single crystal Si target and Poly crystal Si targetPurity: Si:99.999% min. and 99.9999%...
Ceramic Target sputtering target TiO2 target
Ceramic Target
TiO2,ZnO,NiO,ZrO2,CdS, Fe2O3,etc.,
with 3N5 min or 4N min.,
made by hot press,
as sputtering targets.
Ceramic TargetTiO2,ZnO,NiO,ZrO2,etc.,with 3N5 min or 4N min.,made by hot press are available as sputtering targets. ...
Aluminum Crimp Aluminum coil for vacuum coating
Aluminum crimp
Application:as vaccum evaporation material
Al purity:99.9% min.or 99.99%
Shape: according to buyer's option
Aluminum CrimpUsed for vacuum coatingAl purity: 99.9% min.or 99.99%Shape: according to buyer's option ...
Aluminium Coil for vacuum metallizing
Aluminium Coil
Used for vacuum coating
Al purity: 99.9% min.or 99.99% 99.99%
Shape: according to buyer's option
Aluminium CoilAluminium product Used for vacuum coatingAl purity: 99.9% min.or 99.99%Shape: according to buyer's optionused for...
silicon target sputtering targets Si target 5N
Silicon target
Purity: Si 5N or 6N
Resistity:0.02ohm/cm max.or 0.5-5 ohm/cm max.
Type: Single and Poly Si Targets
Silicon targetType: Single crystal Si sputtering target and Poly crystal Si sputtering targetPurity: Si:99.999%...
IMO(In2O3+MoO3) target Ceramic target
IMO Target
Purity: 4N min.
Processing method: Hot press
Relative Density: 85% min.
Tolerance:+/-0.2mm
IMO TargetPurity: 4N min.Processing method: Hot pressRelative Density: 85% min.Tolerance:+/-0.2mmDelivery term: 35days ...
TiAl Target sputtering target TiAl alloy
TiAl Target
Atom Ration: 50:50, 75:25 or customer designs
Purity: TiAl 99.8% min.
Relative Density: 98%
TiAl Target Used as sputtering target for coating toolsAtom Ration: 50:50, 75:25 or according to customer designsPurity: TiAl 99.8%...